Effect of Implantation of Ba+ Ions on the Composition of MoO3 Nanofilms Produced by Thermal Oxidation

Authors

  • G. Kh. Allayarova Karshi state university, Karshi 180117 Uzbekistan, National University of Uzbekistan named after M. Ulugbek, St. University 4, 100174, Tashkent Uzbekistan
  • G. T. Rakhmonov Tashkent state technical university, Tashkent 100095 Uzbekistan, National University of Uzbekistan named after M. Ulugbek, St. University 4, 100174, Tashkent Uzbekistan
  • B. E. Umirzakov Tashkent state technical university, Tashkent 100095 Uzbekistan, National University of Uzbekistan named after M. Ulugbek, St. University 4, 100174, Tashkent Uzbekistan

Keywords:

ion implantation, heating, band gap, barrier layer

Abstract

The determined optimal conditions (oxygen pressure, substrate temperature) for obtaining nanofilms of molybdenum oxides on the Mo(111) surface by the thermal oxidation method. It has been found that the oxidation of Mo(111) with a thin film of Ba (ϴ ≈ 6 monolayers) oxidizes both Ba and Mo atoms. In the case of Mo(111) implanted with Ba+ ions at a saturation dose (D=6•10-16), Ba atoms are mainly oxidized in the ion-implanted layer. It was also found that in this case, a barrier layer is formed, which sharply hinders (or prevents) the diffusion of oxygen into the depth of the target.

The first found that at T=750-800 K oxide MoO4 is formed, at T=850-900 K MoO3, and at T=1000-1200K MoO2.

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Published

2022-12-19

How to Cite

Allayarova, G. K. ., Rakhmonov, G. T. ., & Umirzakov, B. E. . (2022). Effect of Implantation of Ba+ Ions on the Composition of MoO3 Nanofilms Produced by Thermal Oxidation. Pioneer: Journal of Advanced Research and Scientific Progress, 1(6), 50–55. Retrieved from https://innosci.org/jarsp/article/view/622